Dr. Stéfan Landis
at CEA-LETI
SPIE Involvement:
Author
Publications (15)

PROCEEDINGS ARTICLE | September 19, 2018
Proc. SPIE. 10775, 34th European Mask and Lithography Conference
KEYWORDS: Lithography, Electron beams, Silicon, Scanning electron microscopy, Optical scanning, Line width roughness, Optical alignment, Semiconducting wafers, Prototyping, Overlay metrology

PROCEEDINGS ARTICLE | September 19, 2018
Proc. SPIE. 10775, 34th European Mask and Lithography Conference
KEYWORDS: Wafer-level optics, Lithography, Metrology, Scatterometry, Machine learning, Maskless lithography, Reflectance spectroscopy, Electron beam direct write lithography, Semiconducting wafers, Inverse optics, Channel projecting optics

PROCEEDINGS ARTICLE | March 22, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Electron beam lithography, Electron beams, Metrology, Lenses, Time metrology, Distance measurement, Process control, Raster graphics, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Lithography, Electron beam lithography, Etching, Metals, Copper, Scanning electron microscopy, Optical alignment, Semiconducting wafers, System on a chip, Back end of line

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Electron beam lithography, Electron beams, Line width roughness, Optical alignment, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | April 27, 2017
Proc. SPIE. 10144, Emerging Patterning Technologies
KEYWORDS: Lithography, Electron beam lithography, FT-IR spectroscopy, Ions, Silicon, Microelectronics, Ion implantation, Integrated circuits, Wet etching, Ion beam lithography

Showing 5 of 15 publications
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