Stefan Meusemann
at Advanced Mask Technology Center GmbH & Co KG
SPIE Involvement:
Publications (6)

Proceedings Article | 5 October 2023 Paper
Jacob König-Otto, Stefan Meusemann
Proceedings Volume 12802, 128020I (2023)
KEYWORDS: Analytic models, Machine learning, Data modeling, Critical dimension metrology, Engineering, Photomasks

Proceedings Article | 19 September 2018 Paper
Proceedings Volume 10775, 1077510 (2018)
KEYWORDS: Machine learning, Principal component analysis, Statistical analysis, Performance modeling, Data modeling, Photomasks, Statistical modeling, Critical dimension metrology, Distance measurement

Proceedings Article | 16 September 2014 Paper
Proceedings Volume 9235, 92350I (2014)
KEYWORDS: Semiconducting wafers, Reticles, Metrology, Critical dimension metrology, Scanning electron microscopy, Metals, Optical proximity correction, Wafer-level optics, Inspection, Scanners

Proceedings Article | 8 November 2012 Paper
Proceedings Volume 8522, 85220B (2012)
KEYWORDS: Critical dimension metrology, Inspection, Photomasks, Scanning electron microscopy, Defect inspection, Spatial resolution, Semiconducting wafers, Control systems, Manufacturing, Data modeling

Proceedings Article | 8 November 2012 Paper
Jan Heumann, Albrecht Ullrich, Clemens Utzny, Stefan Meusemann, Frank Kromer, John Whittey, Edgardo Garcia, Mark Wagner, Norbert Schmidt
Proceedings Volume 8522, 85220G (2012)
KEYWORDS: Critical dimension metrology, Photomasks, Inspection, Semiconducting wafers, Scanning electron microscopy, Optical testing, Electron microscopes, Opacity, Manufacturing, Wafer manufacturing

Showing 5 of 6 publications
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