Mr. Stefan Meusemann
at Advanced Mask Technology Center GmbH & Co KG
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | September 16, 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Wafer-level optics, Reticles, Metrology, Metals, Scanners, Inspection, Scanning electron microscopy, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Opacity, Manufacturing, Inspection, Electron microscopes, Optical testing, Scanning electron microscopy, Photomasks, Critical dimension metrology, Semiconducting wafers, Wafer manufacturing

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Data modeling, Manufacturing, Inspection, Control systems, Scanning electron microscopy, Photomasks, Spatial resolution, Critical dimension metrology, Semiconducting wafers, Defect inspection

PROCEEDINGS ARTICLE | June 30, 2012
Proc. SPIE. 8441, Photomask and Next-Generation Lithography Mask Technology XIX
KEYWORDS: Lithography, Reticles, Principal component analysis, Manufacturing, Inspection, Scanning electron microscopy, Photomasks, Spatial resolution, Critical dimension metrology, Photoresist processing

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