Stefan Meusemann
at Advanced Mask Technology Center GmbH & Co KG
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 19 September 2018 Paper
Proc. SPIE. 10775, 34th European Mask and Lithography Conference
KEYWORDS: Machine learning, Principal component analysis, Statistical analysis, Performance modeling, Data modeling, Photomasks, Statistical modeling, Critical dimension metrology, Distance measurement

Proceedings Article | 16 September 2014 Paper
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Semiconducting wafers, Reticles, Metrology, Critical dimension metrology, Scanning electron microscopy, Metals, Optical proximity correction, Wafer-level optics, Inspection, Scanners

Proceedings Article | 8 November 2012 Paper
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Critical dimension metrology, Photomasks, Inspection, Semiconducting wafers, Scanning electron microscopy, Optical testing, Electron microscopes, Opacity, Manufacturing, Wafer manufacturing

Proceedings Article | 8 November 2012 Paper
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Critical dimension metrology, Inspection, Photomasks, Scanning electron microscopy, Defect inspection, Spatial resolution, Semiconducting wafers, Control systems, Manufacturing, Data modeling

Proceedings Article | 30 June 2012 Paper
Proc. SPIE. 8441, Photomask and Next-Generation Lithography Mask Technology XIX
KEYWORDS: Critical dimension metrology, Reticles, Photoresist processing, Photomasks, Principal component analysis, Inspection, Scanning electron microscopy, Spatial resolution, Lithography, Manufacturing

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