Dr. Stefan Spratte Profile

Dr. Stefan Spratte

Product Manager at Lambda Physik AG

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Author

Publications (5)

Proceedings Article | 28 May 2004 Paper

Sub-0.25-pm 50-W amplified excimer laser system for 193-nm lithography

Sergei Govorkov, Alexander Wiessner, Gongxue Hua, Timur Misuryaev, Andrey Knysh, Stefan Spratte, Peter Lokai, Tamas Nagy, Igor Bragin, Andreas Targsdorf, Thomas Schroeder, Hans-Stephan Albrecht, Rainer Desor, Thomas Schmidt, Rainer Paetzel

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536374

KEYWORDS: Oscillators, Optical amplifiers, Excimer lasers, Laser systems engineering, Lithography, Molybdenum, Amplifiers, Optical lithography, Optics manufacturing, Pulsed laser operation

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Proceedings Article | 10 November 2003 Paper

F2-laser systems prepared for advanced applications at 157 nm

R. Delmdahl, K. Mannel, S. Spratte, U. Rebhan, S. Govorkov, K. Vogler, I. Bragin

Proceedings Volume 5120, (2003) https://doi.org/10.1117/12.515515

KEYWORDS: Fluorine, Quartz, Laser applications, Optical lithography, Lithography, Polymers, Excimer lasers, Silica, Micromachining, Telecommunications

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Proceedings Article | 26 June 2003 Paper

High-power excimer lasers for 157-nm lithography

Stefan Spratte, Frank Voss, Igor Bragin, Elko Bergmann, Norbert Niemoeller, Tamas Nagy, Ulrich Rebhan, Andreas Targsdorf, Rainer Paetzel, Sergei Govorkov, Gongxue Hua

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485345

KEYWORDS: Lithography, Pulsed laser operation, Laser stabilization, High power lasers, Reliability, Laser development, Excimer lasers, Laser resonators, Optical lithography, Laser optics

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Proceedings Article | 26 June 2003 Paper

Excimer lasers for superhigh NA 193-nm lithography

Rainer Paetzel, Hans Albrecht, Peter Lokai, Wolfgang Zschocke, Thomas Schmidt, Igor Bragin, Thomas Schroeder, Christian Reusch, Stefan Spratte

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485344

KEYWORDS: Laser stabilization, Laser optics, Excimer lasers, Optical lithography, Pulsed laser operation, Signal detection, Calibration, Oscillators, Optical components, Laser development

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Proceedings Article | 30 July 2002 Paper

High-power high-repetition-rate F2 lasers for 157-nm lithography

Klaus Vogler, Ingo Klaft, Frank Voss, Igor Bragin, Elko Bergmann, Tamas Nagy, Norbert Niemoeller, Stefan Spratte, Rainer Paetzel, Sergei Govorkov, Gongxue Hua

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474614

KEYWORDS: Lithography, Laser stabilization, Prototyping, Pulsed laser operation, Vacuum ultraviolet, High power lasers, Laser development, Spatial coherence, Laser metrology, Polarization

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