Dr. Stefan Wurm
Managing Member at ATICE LLC
SPIE Involvement:
Conference Program Committee | Author
Publications (40)

PROCEEDINGS ARTICLE | November 9, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Metrology, Calibration, Image processing, Scanners, Image acquisition, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Electromagnetic coupling, Prototyping

PROCEEDINGS ARTICLE | September 4, 2015
Proc. SPIE. 9661, 31st European Mask and Lithography Conference
KEYWORDS: Wafer-level optics, Imaging systems, Inspection, Optical inspection, Wafer inspection, Photomasks, Extreme ultraviolet, Semiconducting wafers, Optics manufacturing, Defect inspection

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9423, Alternative Lithographic Technologies VII
KEYWORDS: Manufacturing, Inspection, Optical inspection, Wafer inspection, Photomasks, Extreme ultraviolet, Semiconducting wafers, Optics manufacturing, Prototyping, Defect inspection

PROCEEDINGS ARTICLE | October 17, 2014
Proc. SPIE. 9231, 30th European Mask and Lithography Conference
KEYWORDS: Lithography, Logic, Optical lithography, Manufacturing, Inspection, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Double patterning technology

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Lithography, Reticles, Optical lithography, Cameras, Sensors, Wavefronts, Projection systems, Extreme ultraviolet, Artificial intelligence, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Mirrors, Optical lithography, Imaging systems, Scanners, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, 3D image processing

Showing 5 of 40 publications
Conference Committee Involvement (3)
Photomask Technology 2015
29 September 2015 | Monterey, California, United States
SPIE Photomask Technology
10 September 2013 | Monterey, California, United States
Photomask Technology
11 September 2012 | Monterey, California, United States
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