Dr. Stefanie Girol-Gunia
at AMD Saxony LLC & Co KG
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 24 March 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Metrology, Atrial fibrillation, Metals, Pattern recognition, Process control, Optical proximity correction, Optical alignment, Computer aided design, Target recognition, Semiconducting wafers

Proceedings Article | 24 March 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Metrology, Detection and tracking algorithms, Databases, Pattern recognition, Scatterometry, Time metrology, Optical alignment, Target recognition, Semiconducting wafers, Overlay metrology

Proceedings Article | 22 March 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Wafer-level optics, Data modeling, Calibration, Etching, Scanners, Optical testing, Process control, Photomasks, Semiconducting wafers, Overlay metrology

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