Dr. Steffen Steinert
at Carl Zeiss SMT GmbH
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | June 12, 2018
Proc. SPIE. 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Reticles, Deep ultraviolet, Scanners, Distortion, Image registration, Pellicles, Photomasks, Optical alignment, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10451, Photomask Technology
KEYWORDS: Semiconductors, Reticles, Metrology, Optical lithography, Scanners, Image registration, Time metrology, Photomasks, Optical alignment, Overlay metrology

PROCEEDINGS ARTICLE | October 5, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Lithography, Reticles, Metrology, Deep ultraviolet, Calibration, Databases, Image registration, Photomasks, Extreme ultraviolet, Overlay metrology

PROCEEDINGS ARTICLE | March 8, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Actuators, Lithography, Reticles, Metrology, Lithium, Image processing, Scanners, Image registration, Process control, Photomasks, Chemical elements, Semiconducting wafers, Yield improvement, Overlay metrology

PROCEEDINGS ARTICLE | October 17, 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Lithography, Metrology, Optical lithography, Lithographic illumination, Image analysis, Image registration, Photomasks, Charge-coupled devices, CCD image sensors, Overlay metrology

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