Dr. Steffen Steinert
at Carl Zeiss SMT GmbH
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 26 September 2019 Paper
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Reticles, Sensors, Scanners, Image registration, Photomasks, Optical alignment, Semiconducting wafers, Overlay metrology

Proceedings Article | 27 June 2019 Paper
Proc. SPIE. 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Reticles, Metrology, Sensors, Etching, Scanners, Image registration, Photomasks, Optical alignment, Semiconducting wafers, Overlay metrology

Proceedings Article | 12 June 2018 Paper
Proc. SPIE. 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Reticles, Deep ultraviolet, Scanners, Distortion, Image registration, Pellicles, Photomasks, Optical alignment, Semiconducting wafers, Overlay metrology

Proceedings Article | 16 October 2017 Paper
Proc. SPIE. 10451, Photomask Technology 2017
KEYWORDS: Semiconductors, Reticles, Metrology, Optical lithography, Scanners, Image registration, Time metrology, Photomasks, Optical alignment, Overlay metrology

Proceedings Article | 5 October 2016 Paper
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Lithography, Reticles, Metrology, Deep ultraviolet, Calibration, Databases, Image registration, Photomasks, Extreme ultraviolet, Overlay metrology

Showing 5 of 7 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top