Stephan Rafler
at Univ Stuttgart
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 3 October 2008
Proc. SPIE. 7155, Ninth International Symposium on Laser Metrology
KEYWORDS: Semiconductors, Lithography, Diffraction, Polarization, Spectroscopy, Computer simulations, Scatterometry, Spectroscopic ellipsometry, Critical dimension metrology, Line edge roughness

Proceedings Article | 25 April 2008
Proc. SPIE. 6995, Optical Micro- and Nanometrology in Microsystems Technology II
KEYWORDS: Diffraction, Refractive index, Lithium, Magnetism, Fourier transforms, Image filtering, Aluminum, Raster graphics, 3D image processing, Maxwell's equations

Proceedings Article | 16 April 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Wafer-level optics, Nanostructures, Diffraction, Defect detection, Polarization, Etching, Manufacturing, Computer simulations, Scanning electron microscopy, Semiconducting wafers

Proceedings Article | 18 June 2007
Proc. SPIE. 6616, Optical Measurement Systems for Industrial Inspection V
KEYWORDS: Diffraction, Refractive index, Photonic crystal fibers, Imaging systems, Image resolution, Interferometry, Tomography, Objectives, Reconstruction algorithms, Phase measurement

Proceedings Article | 18 June 2007
Proc. SPIE. 6617, Modeling Aspects in Optical Metrology
KEYWORDS: Ellipsometry, Diffraction, Polarization, Etching, Scanning electron microscopy, Scatterometry, Spectroscopic ellipsometry, Picosecond phenomena, Jones vectors, Systems modeling

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