Dr. Stephane Godny
at IMEC
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | March 24, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Lithography, Metrology, Optical lithography, Diffractive optical elements, Etching, Scatterometry, Process control, Critical dimension metrology, Semiconducting wafers, Scatter measurement

PROCEEDINGS ARTICLE | April 10, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Diffraction, Metrology, Image processing, Scanning electron microscopy, Scatterometry, Uncertainty analysis, Critical dimension metrology, Performance modeling, Overlay metrology, Diffraction gratings

PROCEEDINGS ARTICLE | April 10, 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Lithography, Metrology, Polymers, Process control, Directed self assembly, Critical dimension metrology, Geometrical optics, Chemical elements, Semiconducting wafers, Scanning transmission electron microscopy

PROCEEDINGS ARTICLE | April 10, 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Lithography, Metrology, Etching, Coating, Transmission electron microscopy, 3D metrology, Process control, Directed self assembly, Nanoimprint lithography, Critical dimension metrology

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top