Dr. Stephane Larivière
at imec
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 22 February 2021 Presentation
Proc. SPIE. 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
KEYWORDS: Electron beam lithography, Metrology, Defect detection, Etching, Metals, Inspection, Extreme ultraviolet, Ruthenium

Proceedings Article | 16 October 2019 Presentation
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Polishing, Metrology, Logic, Etching, Copper, Inspection, Extreme ultraviolet, Optical alignment, Overlay metrology, Chemical mechanical planarization

Proceedings Article | 26 March 2019 Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Lithography, Modulation, Inspection, Optical inspection, Bridges, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Stochastic processes

Proceedings Article | 20 March 2019 Presentation + Paper
Proc. SPIE. 10963, Advanced Etch Technology for Nanopatterning VIII
KEYWORDS: Optical lithography, Etching, Silicon, 3D modeling, Process control, Critical dimension metrology, Semiconducting wafers, Yield improvement

Proceedings Article | 23 March 2018 Presentation + Paper
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Optical lithography, Etching, Metals, Copper, Resistance, Photomasks, Extreme ultraviolet, Critical dimension metrology, Semiconducting wafers, Tin

Showing 5 of 10 publications
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