Mr. Stephen J. Buffat
Staff Research Scientist at Lockheed Martin
SPIE Involvement:
Conference Program Committee | Author
Publications (2)

PROCEEDINGS ARTICLE | June 11, 1999
Proc. SPIE. 3678, Advances in Resist Technology and Processing XVI
KEYWORDS: Oxides, Electron beams, Deep ultraviolet, Ions, Silicon, Scanning electron microscopy, Photoresist materials, Photomasks, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | July 7, 1997
Proc. SPIE. 3051, Optical Microlithography X
KEYWORDS: Optical lithography, Metals, Interfaces, Manufacturing, Reflectivity, Photoresist materials, Aluminum, Wafer manufacturing, Resist chemistry, Absorption

Conference Committee Involvement (1)
Data Analysis and Modeling for Patterning Control III
23 February 2006 | San Jose, California, United States
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top