Dr. Stephen J. DeMoor
SMTS CMOS1 Lithography at Texas Instruments Inc
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 15 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Monochromatic aberrations, Sensors, Calibration, Etching, Scanners, Process control, Semiconducting wafers, Chemical mechanical planarization, Back end of line, Front end of line

Proceedings Article | 28 May 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Monochromatic aberrations, Metrology, Lithographic illumination, Scanners, Control systems, Solids, Critical dimension metrology, Semiconducting wafers, Fiber optic illuminators

Proceedings Article | 24 May 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Metrology, Data modeling, Phase modulation, Matrices, Scanners, Error analysis, Optical alignment, Semiconducting wafers, Statistical modeling, Overlay metrology

Proceedings Article | 26 June 2003
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Lithography, Monochromatic aberrations, Optical lithography, Image processing, Scanners, Error analysis, Manufacturing, Image analysis, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 2 June 2003
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Metrology, Roads, Data modeling, Imaging systems, Scanners, Optical alignment, Critical dimension metrology, Chemical elements, Semiconducting wafers, Overlay metrology

Showing 5 of 6 publications
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