Stephen H. Kim
Manager at Mentor, a Siemens Business
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 3 October 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Computing systems, Data processing, Distributed computing, Optical proximity correction, Data communications, Data storage servers

Proceedings Article | 19 September 2018
Proc. SPIE. 10775, 34th European Mask and Lithography Conference
KEYWORDS: Lithography, Visualization, Manufacturing, Photomasks, Optical proximity correction, Operating systems, Electronic design automation, Network architectures

Proceedings Article | 18 March 2015
Proc. SPIE. 9427, Design-Process-Technology Co-optimization for Manufacturability IX
KEYWORDS: Semiconductors, Visualization, Manufacturing, Data processing, Photomasks, Integrated circuits, Optical proximity correction, Back end of line, Front end of line, Design for manufacturability

Proceedings Article | 14 October 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Databases, Manufacturing, Inspection, Data processing, Explosives, Data conversion, Neodymium, Photomask technology, Polonium, Current controlled current source

Proceedings Article | 20 May 2011
Proc. SPIE. 8081, Photomask and Next-Generation Lithography Mask Technology XVIII
KEYWORDS: Human-machine interfaces, Lithography, Metrology, Visualization, Interfaces, Image analysis, Image registration, Photomasks, Double patterning technology, 193nm lithography

Showing 5 of 7 publications
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