Stephen J. Lickteig
IM Application Engineer at Tokyo Electron America Inc
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 5 April 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Lithography, Metrology, Manufacturing, Control systems, Scatterometry, Time metrology, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Environmental sensing

Proceedings Article | 24 March 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Beam splitters, Light sources, Optical lithography, Cameras, Manufacturing, Inspection, Diffusers, Semiconducting wafers, Light, Defect inspection

Proceedings Article | 24 March 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Metrology, Optical lithography, Defect detection, Manufacturing, Inspection, Control systems, Wafer inspection, Optical alignment, Semiconducting wafers, Defect inspection

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