Mr. Stephen P. Osborne Profile

Stephen P. Osborne

Process Dev. Chemist at Applied Materials Inc

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Author

Publications (5)

Proceedings Article | 20 August 2004 Paper

Comparative study of two negative CAR resists: EN-024M and NEB 31

Ki-Ho Baik, Robert Dean, Homer Lem, Stephen Osborne, Mark Mueller, Damon Cole

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557718

KEYWORDS: Coating, Line edge roughness, Scanning electron microscopy, Etching, Photomicroscopy, Lithography, Photomasks, Critical dimension metrology, Optical proximity correction, Raster graphics

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Proceedings Article | 17 December 2003 Paper

Improving global CD uniformity by optimizing post-exposure bake and develop sequences

Stephen Osborne, Mark Mueller, Homer Lem, David Reyland, KiHo Baik

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518479

KEYWORDS: Etching, Platinum, Photoresist processing, Nitrogen, Domes, Photomasks, Critical dimension metrology, Metrology, Coating, Curtains

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Proceedings Article | 28 August 2003 Paper

Comparative study between REAP 200 and FEP171 CAR with 50 kV raster e-beam system for sub-100-nm technology

Ki-Ho Baik, Homer Lem, Robert Dean, Stephen Osborne, Mark Mueller, Frank Abboud

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504186

KEYWORDS: Etching, Scanning electron microscopy, Line edge roughness, Photomicroscopy, Raster graphics, Coating, Photomasks, Lithography, Critical dimension metrology, Photoresist processing

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Proceedings Article | 1 July 2002 Paper

REAP (raster e-beam advanced process) using 50-kV raster e-beam system for sub-100-nm node mask technology

Ki-Ho Baik, Robert Dean, Mark Mueller, Maiying Lu, Homer Lem, Stephen Osborne, Frank Abboud

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472315

KEYWORDS: Etching, Coating, Line edge roughness, Raster graphics, Image processing, Dry etching, Photoresist processing, Lithography, Critical dimension metrology, Photomasks

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Proceedings Article | 11 March 2002 Paper

Process optimization for particle removal on blank chrome mask plates in preparation for resist application

Stephen Osborne, Eryn Smith, Eric Woster, Anthony Pelayo

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458347

KEYWORDS: Particles, Photomasks, Coating, Photoresist processing, Acoustics, Molecules, Wave propagation, Lithography, Ozone, Ultraviolet radiation

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