Stephen P. Osborne
Process Dev. Chemist at Applied Materials Inc
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 20 August 2004 Paper
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Lithography, Etching, Coating, Scanning electron microscopy, Photomasks, Optical proximity correction, Raster graphics, Critical dimension metrology, Line edge roughness, Photomicroscopy

Proceedings Article | 17 December 2003 Paper
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Metrology, Curtains, Etching, Nitrogen, Coating, Platinum, Domes, Photomasks, Critical dimension metrology, Photoresist processing

Proceedings Article | 28 August 2003 Paper
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Lithography, Etching, Coating, Scanning electron microscopy, Photomasks, Raster graphics, Critical dimension metrology, Line edge roughness, Photomicroscopy, Photoresist processing

Proceedings Article | 1 July 2002 Paper
Proc. SPIE. 4688, Emerging Lithographic Technologies VI
KEYWORDS: Lithography, Etching, Dry etching, Image processing, Coating, Photomasks, Raster graphics, Critical dimension metrology, Line edge roughness, Photoresist processing

Proceedings Article | 11 March 2002 Paper
Proc. SPIE. 4562, 21st Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Ultraviolet radiation, Particles, Molecules, Coating, Wave propagation, Photomasks, Acoustics, Ozone, Photoresist processing

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