Stephen P. Osborne
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 17 April 2012
Proc. SPIE. 8352, 28th European Mask and Lithography Conference
KEYWORDS: Contamination, Quartz, Particles, Interfaces, Manufacturing, Inspection, Chromium, Photomasks, Extreme ultraviolet, Phase shifts

Proceedings Article | 27 May 2009
Proc. SPIE. 7470, 25th European Mask and Lithography Conference
KEYWORDS: Particles, Optical microscopy, Head, Optical tracking, Photomasks, Thin film coatings, Semiconducting wafers, Fluid dynamics, Mask cleaning, Information operations

Proceedings Article | 3 May 2007
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Reflection, Particles, Reflectivity, Wave plates, Scanning electron microscopy, Head, Photomasks, Aluminum, Cavitation, Acoustics

Proceedings Article | 20 May 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Reticles, Air contamination, Ultraviolet radiation, Particles, Crystals, Ions, Silicon, Photomasks, Ion exchange, Mask cleaning

Proceedings Article | 8 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Ultraviolet radiation, Particles, Ions, Silicon, Reflectivity, Molybdenum, Ozone, Mask cleaning, Phase shifts

Showing 5 of 6 publications
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