Dr. Stephen P. Renwick
Director, Fundamental Technologies at Nikon Research Corp of America
SPIE Involvement:
Author | Editor
Publications (27)

Proceedings Article | 10 April 2024 Presentation + Paper
Yoji Watanabe, Yuho Kanaya, Yosuke Okudaira, Shunsuke Kibayashi, Toshiaki Sakamoto, Yasushi Mizuno, Kazuo Masaki, Soichi Owa, Thomas Koo, Bryant Lin, Michael Tan, David Tseng, Conrad Sorensen, Sujuan Li, Stephen Renwick, Noriyuki Hirayanagi, Bausan Yuan
Proceedings Volume 12953, 129530R (2024) https://doi.org/10.1117/12.3010082
KEYWORDS: Spatial light modulators, Micromirrors, Optical lithography, Maskless lithography, Phase shifting

SPIE Journal Paper | 2 December 2023 Open Access
JM3, Vol. 22, Issue 04, 041401, (December 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.4.041401
KEYWORDS: Direct write lithography, Electron beam direct write lithography, Semiconducting wafers, Lithography, Photomasks, Vestigial sideband modulation, Semiconductors, Wafer level optics, Universities, Soldiers

Proceedings Article | 29 September 2023 Paper
Yuho Kanaya, Yoji Watanabe, Toshiaki Sakamoto, Yasushi Mizuno, Ryota Matsui, Yosuke Okudaira, Shunsuke Kibayashi, Koshi Komuro, Hiroyuki Tsukamoto, Kazuo Masaki, Soichi Owa, Thomas Koo, David Tseng, Conrad Sorensen, Sujuan Li, Michael Tan, Bryant Lin, Stephen Renwick, Noriyuki Hirayanagi, Bausan Yuan
Proceedings Volume 12915, 129150G (2023) https://doi.org/10.1117/12.2684546
KEYWORDS: Maskless lithography, Direct write lithography, Scanners, Printing, Optical proximity correction, Spatial light modulators, Semiconducting wafers, Photomasks, Raster graphics, Projection systems

SPIE Journal Paper | 5 June 2023
JM3, Vol. 22, Issue 04, 041403, (June 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.4.041403
KEYWORDS: Semiconducting wafers, Spatial light modulators, Deep ultraviolet, Optical proximity correction, UV optics, Solid state lasers, Pulsed laser operation, Lithography, Chip manufacturing, Printing

Proceedings Article | 28 April 2023 Presentation + Paper
Proceedings Volume 12494, 124940A (2023) https://doi.org/10.1117/12.2657730
KEYWORDS: Semiconducting wafers, Scanners, Optical proximity correction, Optical lithography, Laser scanners, Semiconductors, Printing, Solid state lasers, Fabrication, Chip manufacturing

Showing 5 of 27 publications
Proceedings Volume Editor (2)

SPIE Conference Volume | 22 October 2021

SPIE Conference Volume | 16 October 2020

Conference Committee Involvement (2)
Photomask Technology
27 September 2021 | Online Only, United States
Photomask Technology
21 September 2020 | Online Only, California, United States
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