Latest progress on Tinsley methods are described for faster stress mirror polishing of the Thirty Meter Telescope primary mirror segments. These methods are outlined, and full scale segment data results are presented. The Tinsley SMP process complements additional processes at ITT Industries Space Systems, with the potential to effectively optically finish all TMT segments.
This paper examines the use of Stressed Mirror Polishing for rapid and low cost fabrication of the large
number of mirror segments required for the TMT primary mirror. Prior experience fabricating Keck mirror segments is
used as a starting point. Specific refinements are made to processes and tooling for faster and more economical
fabrication of segments ready for Ion Beam Figuring. Analytical calculations, finite element analyses, design trades,
and stressing fixture conceptual designs are presented. Feasibility of Stressed Mirror Polishing is demonstrated and
recommendations for further work are given.
The EUV optical system of the Reticle Imaging Microscope (RIM) for EUV mask inspection consists of a pinched Xeplasma source, a pupil-relayed Koehler-type illumination system and an equal-radii Cassegrain-type microscope with a 10x magnification1.
The 3D surface topologies were characterized over spatial wavelengths ranging from the clear apertures down to a few nanometers by using a portfolio of instruments including contacting profilometry, phase-shifting interferometry at 633 nm at various magnifications and Atomic Force Microscopy. Measured 3D topography maps were Fourier analyzed and Power Spectral Densities (PSDs) are computed over spatial periods ranging from the critical aperture down to a few nm. Integrated RMS surface errors over typically reported spatial period ranges were computed. For a different optical system we improved our polishing process to reduce surface errors for spatial periods below 10 mm. PSDs and integrated RMS surface errors will be shown in comparison with typical RIM surfaces.
All surfaces of the RIM optical system were coated with high-reflectivity coatings to maximize optical throughput. A description of the coatings and their performance had been published recently by Michael Kriese et al.2 The transmitted wavefront error (TWF) of the imager module was measured in a double pass configuration using a Fizeau-type Interferometer at 633 nm wavelength and a convex retrosphere. The measured TWF will be shown over the entire Numerical Aperture (NA = 0.0625) of the microscope. The integrated RMS of the TWF measured 0.79 nm.
To perform actinic inspection of patterned EUV reticles with diffraction-limited resolution at 13.5 nm wavelength aspheric optical surfaces with surface figure errors and roughnesses well below 1 nm had to be developed.
The 3D surface topologies of prototype optical components were characterized over spatial periods ranging from the clear apertures down to 25 nanometers over 6 orders of magnitude by using a portfolio of instruments.
3D topography maps were Fourier analyzed and averaged Power Spectral Densities (PSDs) computed over the entire spatial frequency range. A good fit to the PSD was achieved with a linear function on a log-log scale. RMS values were computed over several spatial period ranges.
All optical surfaces were coated with high-reflectivity coatings to maximize optical throughput at 13.5 nm for the average angle-of-incidence of each optic. The spectral reflectivity of the HR coatings, consisting of Molybdenum-Silicon bi-layers (40 periods) were measured using synchrotron instruments at the NIST/DARPA EUV Reflectometry Facility and the Center for X-Ray Optics at Lawrence Berkeley National Laboratory. Total variations (PV) of peak-position within the clear-apertures ranged from 0.005 nm to 0.020 nm, with the one exception being a highly-curved convex surface yielding a PV variation of 0.040 nm. Peak reflectivity variation was typically 0.2% to 1% PV over the clear aperture, with some of the variation being instrument precision. One optic was coated with Ruthenium only, approximately 16nm thick, with less than ±0.1 nm variation in thickness. Detailed information on the spectral reflectivity for the coatings is discussed.