Mr. Stephen R. Turner
at Brewer Science Inc
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | April 2, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Multilayers, Etching, Particles, Dielectrics, Silicon, Manufacturing, Resistance, Semiconducting wafers, Back end of line, Front end of line

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Etching, Silicon, Reflectivity, Chemical vapor deposition, Photoresist materials, Thin film coatings, Semiconducting wafers, Yield improvement, Back end of line, Front end of line

PROCEEDINGS ARTICLE | June 12, 2003
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Oxides, Refractive index, Optical lithography, Contamination, Capacitors, Metals, Reflectivity, Photoresist materials, Semiconducting wafers, Bottom antireflective coatings

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