Dr. Sterling Watson
Senior Director at KLA-Tencor
SPIE Involvement:
Author
Publications (13)

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Lithography, Data modeling, Modulation, Backscatter, Monte Carlo methods, Photomasks, SRAF, Critical dimension metrology, Semiconducting wafers, Model-based design

PROCEEDINGS ARTICLE | March 20, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Reticles, Optical lithography, Defect detection, Inspection, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Line edge roughness, Semiconducting wafers, Defect inspection

PROCEEDINGS ARTICLE | August 20, 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Lithography, Reticles, Defect detection, Deep ultraviolet, Sensors, Databases, Quartz, Image processing, Inspection, Image transmission

PROCEEDINGS ARTICLE | December 17, 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Reticles, Defect detection, Sensors, Image processing, Manufacturing, Inspection, Image resolution, Image transmission, SRAF

PROCEEDINGS ARTICLE | August 28, 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Lithography, Reticles, Defect detection, Databases, Ultraviolet radiation, Inspection, SRAF, Semiconducting wafers, 193nm lithography, Defect inspection

PROCEEDINGS ARTICLE | June 2, 2003
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Lithography, Reticles, Defect detection, Detection and tracking algorithms, Image segmentation, Inspection, Critical dimension metrology, Algorithm development, Semiconducting wafers, Defect inspection

Showing 5 of 13 publications
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