Dr. Sterling Watson
Senior Director at KLA Corp
SPIE Involvement:
Author
Publications (14)

Proceedings Article | 22 January 2018
Proc. SPIE. 10451, Photomask Technology 2017
KEYWORDS: Reticles, Defect detection, Data modeling, Databases, Particles, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 8 November 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Lithography, Data modeling, Modulation, Backscatter, Monte Carlo methods, Photomasks, SRAF, Critical dimension metrology, Semiconducting wafers, Model-based design

Proceedings Article | 20 March 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Reticles, Optical lithography, Defect detection, Inspection, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Line edge roughness, Semiconducting wafers, Defect inspection

Proceedings Article | 20 August 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Lithography, Reticles, Defect detection, Deep ultraviolet, Sensors, Databases, Quartz, Image processing, Inspection, Image transmission

Proceedings Article | 17 December 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Reticles, Defect detection, Sensors, Image processing, Manufacturing, Inspection, Image resolution, Image transmission, SRAF

Showing 5 of 14 publications
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