Dr. Steve Ayres
Senior Applications Engineer - EMD at Hitachi High Technologies America
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | April 14, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Signal to noise ratio, Optical spheres, Silica, Light scattering, Inspection, Bidirectional reflectance transmission function, Latex, Plasma etching, Semiconducting wafers, Plasma

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Metrology, Capacitors, Etching, Composites, 3D modeling, Atomic force microscopy, Scanning electron microscopy, Scatterometry, 3D metrology, Semiconducting wafers

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