Steve A. McGarvey
Senior Application Engineer at Hitachi High Technologies America Inc
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 28 March 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Scanning electron microscopy, Defect inspection, Inspection, Electron microscopes, Image processing, Semiconducting wafers, Process control, Semiconductor manufacturing, High volume manufacturing, Research facilities, Oxides, Silicon, Francium, Defect detection

Proceedings Article | 25 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Inspection, Scanning electron microscopy, Classification systems, Bidirectional reflectance transmission function, Latex, Optical spheres, Electron microscopes, Defect inspection, Semiconducting wafers, Optical scanning systems, Wafer inspection, Wafer manufacturing, Wafer testing, Silica, Light scattering, Air contamination, Copper, Optical properties

Proceedings Article | 14 April 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Bidirectional reflectance transmission function, Semiconducting wafers, Inspection, Optical spheres, Light scattering, Plasma etching, Silica, Latex, Signal to noise ratio, Plasma

Proceedings Article | 10 April 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Semiconducting wafers, Silicon, Bidirectional reflectance transmission function, Inspection, Manufacturing, Light scattering, Polarization, Surface roughness, Scattering, Wafer testing

Proceedings Article | 6 April 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Aluminum, Light scattering, Optical spheres, Semiconducting wafers, Bidirectional reflectance transmission function, Inspection, Atmospheric modeling, Scanning electron microscopy, Atomic force microscopy, Scattering

Showing 5 of 10 publications
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