Mr. Steve M. Tanner Profile

Steve M. Tanner

Senior Process Engineer at DNSE

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Publications (1)

Proceedings Article | 29 June 1998 Paper

Minimizing photoresist dispense volumes on organic antireflective layers: the effects of chemistry and coating methodology on defect size and density

Andrew Bair, Audrey Davis, Bradley Lantz, Jeffrey Johnson, Charles Spinner, Steve Tanner, Von Marcos, Hiroshi Matsui

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312463

KEYWORDS: Semiconducting wafers, Photoresist materials, Antireflective coatings, Coating, Chemistry, Thin film coatings, Particles, Photoresist developing, Interfaces, Semiconductor manufacturing

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