Dr. Steven L. Carson
Principal Engineer at Intel Corp
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Reticles, Optical lithography, Scanners, Inspection, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Yield improvement

PROCEEDINGS ARTICLE | April 8, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Lithography, Phase shifting, Reflection, Electroluminescence, Photomasks, Extreme ultraviolet, Line width roughness, Cadmium sulfide, Extreme ultraviolet lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | March 18, 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Reticles, Optical lithography, Particles, Inspection, Photoresist materials, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | March 18, 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Thin films, Photovoltaics, Reticles, Data modeling, Error analysis, Distortion, Image registration, Finite element methods, Photomasks, Extreme ultraviolet

PROCEEDINGS ARTICLE | July 1, 2003
Proc. SPIE. 5044, Advanced Process Control and Automation
KEYWORDS: Semiconductors, Error analysis, Manufacturing, Control systems, Process control, Semiconductor manufacturing, Optical alignment, Feedback control, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | July 1, 2003
Proc. SPIE. 5044, Advanced Process Control and Automation
KEYWORDS: Detection and tracking algorithms, Data modeling, Manufacturing, Control systems, Process control, Semiconductor manufacturing, Algorithm development, Feedback control, Process modeling, Correlation function

Showing 5 of 6 publications
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