Dr. Steven Fu
at KLA-Tencor Corp
SPIE Involvement:
Publications (8)

Proceedings Article | 24 March 2006 Paper
Proceedings Volume 6152, 61521W (2006) https://doi.org/10.1117/12.655746
KEYWORDS: Single crystal X-ray diffraction, Semiconducting wafers, Data modeling, Scatterometry, Finite element methods, Lithography, Metrology, Process control, Photoresist processing, Scatter measurement

Proceedings Article | 17 May 2005 Paper
Wen-Kuang Lin, Shih-Hsien Liao, Ronghao Tsai, Mike Yeh, Calvino Hsieh, Y. Yu, Benjamin Szu-Min Lin, Steven Fu, Thaddeus Dziura
Proceedings Volume 5755, (2005) https://doi.org/10.1117/12.598983
KEYWORDS: Critical dimension metrology, Single crystal X-ray diffraction, Etching, Scanners, Metrology, Process control, Spectroscopy, Control systems, Switching, Spectroscopic ellipsometry

Proceedings Article | 10 May 2005 Paper
Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.598979
KEYWORDS: Critical dimension metrology, Semiconducting wafers, Etching, Metrology, Single crystal X-ray diffraction, Lithography, Spectroscopic ellipsometry, Inspection, Scatterometry, Temperature metrology

Proceedings Article | 24 May 2004 Paper
Mike Yeh, Shu-Ping Fang, Bo-Jau Tsau, Chih-Chung Huang, Benjamin Lin, Steven Fu, Jay Chen, Regina Freed, Ted Dziura, Mike Slessor
Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.536269
KEYWORDS: Semiconducting wafers, Critical dimension metrology, Metrology, Etching, Spectroscopic ellipsometry, Cadmium, Scanning electron microscopy, Transistors, Atomic force microscopy, Single crystal X-ray diffraction

Proceedings Article | 15 July 2003 Paper
Pey-Yuan Lee, Chi-Shen Lo, Yi-Hung Chen, Thomas Teng, Steven Fu, Mico Chu, Jason Yee
Proceedings Volume 5041, (2003) https://doi.org/10.1117/12.485227
KEYWORDS: Metals, Data modeling, Materials processing, Material characterization, Diagnostics, Manufacturing, Carbon, Contamination, Plasma, Critical dimension metrology

Showing 5 of 8 publications
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