Dr. Steven Fu
at KLA-Tencor Corp
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 24 March 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Lithography, Metrology, Data modeling, Scatterometry, Process control, Finite element methods, Photoresist processing, Semiconducting wafers, Scatter measurement, Single crystal X-ray diffraction

Proceedings Article | 17 May 2005
Proc. SPIE. 5755, Data Analysis and Modeling for Process Control II
KEYWORDS: Metrology, Switching, Etching, Scanners, Spectroscopy, Control systems, Process control, Spectroscopic ellipsometry, Critical dimension metrology, Single crystal X-ray diffraction

Proceedings Article | 10 May 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Lithography, Metrology, Etching, Inspection, Scatterometry, Spectroscopic ellipsometry, Critical dimension metrology, Semiconducting wafers, Temperature metrology, Single crystal X-ray diffraction

Proceedings Article | 24 May 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Metrology, Cadmium, Etching, Atomic force microscopy, Scanning electron microscopy, Spectroscopic ellipsometry, Transistors, Critical dimension metrology, Semiconducting wafers, Single crystal X-ray diffraction

Proceedings Article | 15 July 2003
Proc. SPIE. 5041, Process and Materials Characterization and Diagnostics in IC Manufacturing
KEYWORDS: Carbon, Contamination, Data modeling, Metals, Materials processing, Manufacturing, Diagnostics, Critical dimension metrology, Material characterization, Plasma

Proceedings Article | 2 June 2003
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Lithography, Metrology, Statistical analysis, Scanners, Error analysis, Time metrology, Process control, Semiconducting wafers, Yield improvement, Overlay metrology

Showing 5 of 8 publications
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