Dr. Steven J. Holmes
at IBM Corp
SPIE Involvement:
Publications (38)

Proceedings Article | 21 March 2017 Presentation + Paper
Nathan Marchack, Marwan Khater, Jason Orcutt, Josephine Chang, Steven Holmes, Tymon Barwicz, Swetha Kamlapurkar, William Green, Sebastian Engelmann
Proceedings Volume 10149, 101490F (2017) https://doi.org/10.1117/12.2258112
KEYWORDS: Line edge roughness, Silicon, Reactive ion etching, Waveguides, Sensor technology, Optical lithography, Silicon photonics, Waveguide sensors, Sensors, Integrated circuits, Plasma, Etching, Line width roughness, Photomasks, Plasma etching, Lithography

Proceedings Article | 16 April 2013 Paper
Sen Liu, Steven Holmes, Kuang Jung Chen, Wu-song Huang, Ranee Kwong, Greg Breyta, Bruce Doris, Kangguo Cheng, Scott Luning, Maud Vinet, Laurent Grenouillet, Qing Liu, Matt Colburn, Chung-Hsi Wu
Proceedings Volume 8682, 86820T (2013) https://doi.org/10.1117/12.2011515
KEYWORDS: Photomasks, Lithography, Semiconducting wafers, Silicon, Reactive ion etching, Polymers, Lithographic illumination, Photoresist processing, Chemistry, Photoresist developing

Proceedings Article | 26 March 2013 Paper
Proceedings Volume 8680, 86801G (2013) https://doi.org/10.1117/12.2011610
KEYWORDS: Critical dimension metrology, Etching, Line width roughness, Semiconducting wafers, Optical lithography, Lithography, Chemical reactions, Photoresist processing, Polymethylmethacrylate, Directed self assembly

Proceedings Article | 16 April 2012 Paper
Chris Bencher, He Yi, Jessica Zhou, Manping Cai, Jeffrey Smith, Liyan Miao, Ofir Montal, Shiran Blitshtein, Alon Lavi, Kfir Dotan, Huixiong Dai, Joy Cheng, Daniel Sanders, Melia Tjio, Steven Holmes
Proceedings Volume 8323, 83230N (2012) https://doi.org/10.1117/12.917993
KEYWORDS: Polymethylmethacrylate, Metrology, Image registration, Scanning electron microscopy, Inspection, Semiconducting wafers, Signal to noise ratio, Polymers, Optical lithography, Directed self assembly

Proceedings Article | 19 March 2012 Paper
Proceedings Volume 8325, 83251B (2012) https://doi.org/10.1117/12.916158
KEYWORDS: Polymers, Reflectivity, Silicon, Semiconducting wafers, Bottom antireflective coatings, Lithography, Chromophores, Critical dimension metrology, Silicon films, Solids

Showing 5 of 38 publications
Conference Committee Involvement (2)
Advances in Resist Technology and Processing XXII
28 February 2005 | San Jose, California, United States
Advances in Resist Technology and Processing XXI
23 February 2004 | Santa Clara, California, United States
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