Dr. Steven J. Holmes
at IBM Corp
SPIE Involvement:
Publications (38)

Proceedings Article | 21 March 2017 Presentation + Paper
Proc. SPIE. 10149, Advanced Etch Technology for Nanopatterning VI
KEYWORDS: Lithography, Optical lithography, Waveguides, Sensors, Etching, Silicon, Photomasks, Line width roughness, Integrated circuits, Plasma etching, Silicon photonics, Line edge roughness, Reactive ion etching, Sensor technology, Waveguide sensors, Plasma

Proceedings Article | 16 April 2013 Paper
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Lithography, Lithographic illumination, Polymers, Silicon, Chemistry, Photomasks, Reactive ion etching, Photoresist processing, Semiconducting wafers, Photoresist developing

Proceedings Article | 26 March 2013 Paper
Proc. SPIE. 8680, Alternative Lithographic Technologies V
KEYWORDS: Lithography, Optical lithography, Polymethylmethacrylate, Etching, Line width roughness, Directed self assembly, Chemical reactions, Critical dimension metrology, Photoresist processing, Semiconducting wafers

Proceedings Article | 16 April 2012 Paper
Proc. SPIE. 8323, Alternative Lithographic Technologies IV
KEYWORDS: Signal to noise ratio, Metrology, Optical lithography, Polymethylmethacrylate, Polymers, Inspection, Image registration, Scanning electron microscopy, Directed self assembly, Semiconducting wafers

Proceedings Article | 19 March 2012 Paper
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Lithography, Polymers, Silicon, Reflectivity, Chromophores, Silicon films, Solids, Critical dimension metrology, Semiconducting wafers, Bottom antireflective coatings

Showing 5 of 38 publications
Conference Committee Involvement (2)
Advances in Resist Technology and Processing XXII
28 February 2005 | San Jose, California, United States
Advances in Resist Technology and Processing XXI
23 February 2004 | Santa Clara, California, United States
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