Dr. Steven M. Labovitz
at Pixer Technology Inc
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | October 17, 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Reticles, Metrology, Deep ultraviolet, Quartz, Air contamination, Pellicles, Photomasks, Critical dimension metrology, Semiconducting wafers, Nonimaging optics

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Deep ultraviolet, Silica, Air contamination, Coating, Chromium, Pellicles, Printing, Photomasks, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Cadmium, Signal attenuation, Calibration, Scanners, Scatterometry, Photomasks, Critical dimension metrology, Semiconducting wafers, Data corrections, Airborne remote sensing

PROCEEDINGS ARTICLE | November 9, 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Contamination, Defect detection, Opacity, Databases, Inspection, Image transmission, Photomasks, Resolution enhancement technologies, Digital breast tomosynthesis

PROCEEDINGS ARTICLE | January 22, 2001
Proc. SPIE. 4186, 20th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Optical lithography, Etching, Image processing, Inspection, Photomasks, Plasma etching, Critical dimension metrology, Semiconducting wafers, Isotropic etching, Phase shifts

PROCEEDINGS ARTICLE | September 1, 1998
Proc. SPIE. 3412, Photomask and X-Ray Mask Technology V
KEYWORDS: Magnesium, Etching, Chromium, Photomasks, Wet etching, Plasma etching, Optical proximity correction, Mask making, Critical dimension metrology, Plasma

Showing 5 of 6 publications
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