Dr. Steven L. Prins
at Texas Instruments Inc
SPIE Involvement:
Author
Publications (14)

PROCEEDINGS ARTICLE | April 3, 2010
Proc. SPIE. 7641, Design for Manufacturability through Design-Process Integration IV
KEYWORDS: Lithography, Optical lithography, Etching, Metals, Scanning electron microscopy, Photomasks, Double patterning technology, Optical proximity correction, Semiconducting wafers, Fiber optic illuminators

PROCEEDINGS ARTICLE | March 16, 2009
Proc. SPIE. 7275, Design for Manufacturability through Design-Process Integration III
KEYWORDS: Lithography, Logic, Data modeling, Manufacturing, Computer simulations, 3D modeling, Transistors, Process modeling, Device simulation, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 13, 2009
Proc. SPIE. 7275, Design for Manufacturability through Design-Process Integration III
KEYWORDS: Lithography, Logic, Optical lithography, Visualization, Metals, Computer simulations, Distributed computing, Photomasks, Raster graphics, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 17, 2008
Proc. SPIE. 6925, Design for Manufacturability through Design-Process Integration II
KEYWORDS: Lithography, Logic, Lithographic illumination, Printing, Design for manufacturing, Photomasks, Optical proximity correction, SRAF, Critical dimension metrology, Model-based design

PROCEEDINGS ARTICLE | March 17, 2008
Proc. SPIE. 6925, Design for Manufacturability through Design-Process Integration II
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Image segmentation, Manufacturing, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers, Fiber optic illuminators

PROCEEDINGS ARTICLE | March 14, 2006
Proc. SPIE. 6156, Design and Process Integration for Microelectronic Manufacturing IV
KEYWORDS: Data modeling, Error analysis, Scanning electron microscopy, Data processing, Image filtering, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers, Process modeling

Showing 5 of 14 publications
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