Dr. Steven A. Scheer
Vice President at imec
SPIE Involvement:
Publications (30)

Proceedings Article | 26 April 2017 Presentation + Paper
Proceedings Volume 10147, 1014704 (2017) https://doi.org/10.1117/12.2258108
KEYWORDS: Optical lithography, Front end of line, Back end of line, Etching, Control systems, Semiconducting wafers, Logic, Extreme ultraviolet, TCAD, Computer simulations, Photomasks, Lithography, Metals

Proceedings Article | 7 April 2017 Presentation + Paper
Frédéric Lazzarino, Nihar Mohanty, Yannick Feurprier, Lior Huli, Vinh Luong, Marc Demand, Stefan Decoster, Victor Vega Gonzalez, Julien Ryckaert, Ryan Ryoung Han Kim, Arindam Mallik, Philippe Leray, Chris Wilson, Jürgen Boemmels, Kaushik Kumar, Kathleen Nafus, Anton deVilliers, Jeffrey Smith, Carlos Fonseca, Julie Bannister, Steven Scheer, Zsolt Tokei, Daniele Piumi, Kathy Barla
Proceedings Volume 10149, 1014908 (2017) https://doi.org/10.1117/12.2258028
KEYWORDS: Optical lithography, Etching, Photomasks, Double patterning technology, Extreme ultraviolet, Semiconductors, High volume manufacturing, Metals, Standards development, Lithography, Amorphous silicon, Coating, System on a chip, Materials processing, Silica, Tin

Proceedings Article | 17 March 2015 Paper
Nihar Mohanty, Elliott Franke, Eric Liu, Angelique Raley, Jeffrey Smith, Richard Farrell, Mingmei Wang, Kiyohito Ito, Sanjana Das, Akiteru Ko, Kaushik Kumar, Alok Ranjan, David O'Meara, Kenjiro Nawa, Steven Scheer, Anton DeVillers, Peter Biolsi
Proceedings Volume 9428, 94280G (2015) https://doi.org/10.1117/12.2085016
KEYWORDS: Etching, Optical lithography, Lithography, Plasma etching, Vacuum ultraviolet, Line edge roughness, Plasma, Semiconducting wafers, Line width roughness, Photomasks

SPIE Journal Paper | 12 March 2014
JM3, Vol. 13, Issue 01, 013012, (March 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.1.013012
KEYWORDS: Particles, Polymers, Line edge roughness, Monte Carlo methods, Diffusion, Photoresist developing, Photoresist materials, Lithography, 3D modeling, Molecules

Proceedings Article | 15 March 2012 Paper
Mark Somervell, Roel Gronheid, Joshua Hooge, Kathleen Nafus, Paulina Rincon Delgadillo, Chris Thode, Todd Younkin, Koichi Matsunaga, Ben Rathsack, Steven Scheer, Paul Nealey
Proceedings Volume 8325, 83250G (2012) https://doi.org/10.1117/12.916406
KEYWORDS: Semiconducting wafers, Image processing, Optical lithography, Thin film coatings, Lithography, Etching, Reticles, Scanners, Scanning electron microscopy, Directed self assembly

Showing 5 of 30 publications
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