Dr. Steven A. Scheer
Vice President at imec
SPIE Involvement:
Publications (30)

Proceedings Article | 26 April 2017 Presentation + Paper
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Lithography, Logic, Optical lithography, Etching, Metals, Control systems, Computer simulations, Photomasks, Extreme ultraviolet, Semiconducting wafers, TCAD, Back end of line, Front end of line

Proceedings Article | 7 April 2017 Presentation + Paper
Proc. SPIE. 10149, Advanced Etch Technology for Nanopatterning VI
KEYWORDS: Amorphous silicon, Semiconductors, Lithography, Optical lithography, Silica, Etching, Metals, Coating, Materials processing, Photomasks, Extreme ultraviolet, Double patterning technology, High volume manufacturing, System on a chip, Standards development, Tin

Proceedings Article | 17 March 2015 Paper
Proc. SPIE. 9428, Advanced Etch Technology for Nanopatterning IV
KEYWORDS: Lithography, Optical lithography, Etching, Photomasks, Line width roughness, Plasma etching, Line edge roughness, Vacuum ultraviolet, Semiconducting wafers, Plasma

SPIE Journal Paper | 12 March 2014
JM3 Vol. 13 Issue 01
KEYWORDS: Particles, Polymers, Line edge roughness, Monte Carlo methods, Diffusion, Photoresist developing, Photoresist materials, Lithography, 3D modeling, Molecules

Proceedings Article | 15 March 2012 Paper
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Lithography, Reticles, Optical lithography, Etching, Image processing, Scanners, Scanning electron microscopy, Directed self assembly, Thin film coatings, Semiconducting wafers

Showing 5 of 30 publications
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