Steven S. Slonaker
Principal Research Scientist at Nikon Research Corp of America
SPIE Involvement:
Conference Program Committee | Author
Publications (25)

Proceedings Article | 15 March 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Optical design, Optical lithography, Statistical analysis, Etching, Image processing, Scanners, Ions, Monte Carlo methods, Computational lithography, Optical proximity correction, Optical alignment, Semiconducting wafers, Integrated circuit design, Performance modeling, 193nm lithography

Proceedings Article | 27 February 2015
Proc. SPIE. 9404, Digital Photography XI
KEYWORDS: Point spread functions, Lenses, Cameras, Image segmentation, Image processing, Image resolution, Distortion, Vignetting, Dysprosium, Optical aberrations

Proceedings Article | 11 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Diffraction, Einsteinium, Polarization, 3D modeling, Near field, Projection systems, Photomasks, Spherical lenses, Semiconducting wafers, Near field optics

Proceedings Article | 4 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Photovoltaics, Fluctuations and noise, Polarization, Calibration, Scanners, Photomasks, Source mask optimization, Optimization (mathematics), Fiber optic illuminators

Proceedings Article | 16 March 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Microscopes, Diffraction, Reticles, Metrology, Optical lithography, Data modeling, Calibration, Error analysis, Distortion, Diffraction gratings

Showing 5 of 25 publications
Conference Committee Involvement (2)
Photomask Technology
7 October 2008 | Monterey, California, United States
Photomask Technology
18 September 2007 | Monterey, California, United States
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