Steven Tottewitz
Staff process engineer at Qoniac GmbH
Area of Expertise:
Lithography Engineer
Publications (7)

Proceedings Article | 20 March 2020 Paper
Proceedings Volume 11325, 113251Y (2020)
KEYWORDS: Distortion, Semiconducting wafers, Optical alignment, Optimization (mathematics), Scanners, Overlay metrology, Process control, Reticles, Data modeling

Proceedings Article | 26 March 2019 Paper
Proceedings Volume 10959, 109592T (2019)
KEYWORDS: Semiconducting wafers, Optical alignment, Data modeling, Overlay metrology, Data corrections, Visualization, Lithography, Reticles, Optimization (mathematics)

Proceedings Article | 26 March 2019 Paper
Proceedings Volume 10959, 109592P (2019)
KEYWORDS: Overlay metrology, Etching, Device simulation, Feedback control, Lithography, Measurement devices, Semiconducting wafers, Control systems, High volume manufacturing, Inspection

Proceedings Article | 13 March 2018 Presentation + Paper
Marshall Overcast, Corey Mellegaard, David Daniel, Boris Habets, Georg Erley, Steffen Guhlemann, Xaver Thrun, Stefan Buhl, Steven Tottewitz
Proceedings Volume 10585, 105851U (2018)
KEYWORDS: Semiconducting wafers, Overlay metrology, Etching, Machine learning, Optical alignment, Error analysis, Metrology, Lithography, Data processing, Semiconductors

Proceedings Article | 13 March 2018 Paper
Proceedings Volume 10585, 105851R (2018)
KEYWORDS: Optical alignment, Semiconducting wafers, Reticles, Overlay metrology, Data modeling, Neodymium, HVAC controls, Distortion, Calibration, Roads

Showing 5 of 7 publications
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