Steven Tottewitz
Staff process engineer at Qoniac GmbH
Area of Expertise:
Lithography Engineer
Websites:
Publications (7)

Proceedings Article | 20 March 2020
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Reticles, Data modeling, Scanners, Distortion, Process control, Optical alignment, Optimization (mathematics), Semiconducting wafers, Overlay metrology

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Lithography, Etching, Inspection, Control systems, Measurement devices, High volume manufacturing, Feedback control, Semiconducting wafers, Overlay metrology, Device simulation

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Lithography, Reticles, Data modeling, Visualization, Optical alignment, Optimization (mathematics), Semiconducting wafers, Data corrections, Overlay metrology

Proceedings Article | 13 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Reticles, Roads, Data modeling, Calibration, Distortion, Optical alignment, Neodymium, Semiconducting wafers, HVAC controls, Overlay metrology

Proceedings Article | 13 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Semiconductors, Lithography, Metrology, Etching, Error analysis, Data processing, Machine learning, Optical alignment, Semiconducting wafers, Overlay metrology

Showing 5 of 7 publications
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