Dr. Steven Verhaverbeke
at Applied Materials Inc
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | June 21, 2006
Proc. SPIE. 6281, 22nd European Mask and Lithography Conference
KEYWORDS: Particles, Chemistry, Reflectivity, Chromium, Photoresist materials, Attenuators, Photomasks, Ozone, Photoresist processing, Photoresist developing

PROCEEDINGS ARTICLE | November 5, 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Particles, Chemistry, Chromium, Photoresist materials, Transmittance, Photomasks, Photoresist processing, Mask cleaning, Plasma, Phase shifts

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