Steven Ha
Reticle Team Manager at SAMSUNG Austin Semiconductor LLC
SPIE Involvement:
Author
Area of Expertise:
Semiconductor foundry busness management , Capital equipment investment , Process/Operation Improvement , High volume/LEAN manufacturing , Change management , Internal quality audit
Profile Summary

Extensive technical and leadership success in start-up as well as established companies. Consistent record of improving performance and creating million-dollar savings from capital investment to process efficiency enhancements. Encourages team members to optimize process based on LEAN/Sigma manufacturing practices. Manages global communication and standardizes system operation. Recognizes leaders to improve morale and thereby productivity and efficiency.
Publications (4)

Proceedings Article | 21 April 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Lithography, Reticles, Databases, Scanners, Inspection, Feature extraction, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Defect inspection

Proceedings Article | 20 October 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Lithography, Reticles, Modulation, Polarization, Inspection, Scanning electron microscopy, Bridges, Photomasks, Semiconducting wafers, Classification systems

Proceedings Article | 2 April 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Semiconductors, Lithography, Optical design, Metrology, Matrices, Scanners, Scatterometry, Finite element methods, Semiconducting wafers, Scatter measurement

Proceedings Article | 25 May 2010
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Lithography, Contamination, Particles, Coating, Manufacturing, Inspection, Servomechanisms, Tantalum, Ozone, Defect inspection

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