Dr. Stewart A. Robertson
Technical Marketing Manager at KLA Texas
SPIE Involvement:
Publications (76)

Proceedings Article | 21 November 2023 Presentation + Paper
Proceedings Volume 12750, 1275003 (2023) https://doi.org/10.1117/12.2688230
KEYWORDS: Stochastic processes, Reticles, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Scanners, Photoresist processing, Nanolithography, Modeling, EUV optics

SPIE Journal Paper | 6 July 2021
JM3, Vol. 20, Issue 03, 031009, (July 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.3.031009
KEYWORDS: Photomasks, Stochastic processes, Binary data, Extreme ultraviolet lithography, Printing, SRAF, Photons, Metrology, Cadmium, Computer simulations

Proceedings Article | 16 October 2020 Presentation + Paper
Proceedings Volume 11518, 115180Y (2020) https://doi.org/10.1117/12.2573261
KEYWORDS: Extreme ultraviolet lithography, Stochastic processes, Photomasks, Printing, Binary data, Phase shifts, Optical lithography, Semiconducting wafers, Critical dimension metrology, Image quality

Proceedings Article | 26 March 2019 Presentation + Paper
Proceedings Volume 10957, 109570J (2019) https://doi.org/10.1117/12.2515124
KEYWORDS: Stochastic processes, Failure analysis, Optical proximity correction, Model-based design, Computer simulations, Extreme ultraviolet lithography

Proceedings Article | 3 October 2018 Presentation + Paper
Proceedings Volume 10809, 108090A (2018) https://doi.org/10.1117/12.2501820
KEYWORDS: Photomasks, Critical dimension metrology, Extreme ultraviolet lithography, Stochastic processes, Optical lithography, Extreme ultraviolet, Calibration, Photoresist processing

Showing 5 of 76 publications
Conference Committee Involvement (2)
Advances in Resist Technology and Processing XXII
28 February 2005 | San Jose, California, United States
Lithography for Semiconductor Manufacturing
19 May 1999 | Edinburgh, United Kingdom
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