Dr. Stewart A. Robertson
Technical Marketing Manager at KLA Tencor Texas
SPIE Involvement:
Conference Program Committee | Author
Publications (72)

PROCEEDINGS ARTICLE | October 3, 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Optical lithography, Calibration, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Photoresist processing, Stochastic processes

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Lithography, Computer simulations, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Stochastic processes, Chemically amplified resists

PROCEEDINGS ARTICLE | March 24, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Lithography, Metrology, Optical lithography, 3D acquisition, Calibration, Manufacturing, Inspection, Computer simulations, Scanning electron microscopy, Monte Carlo methods, 3D metrology, Critical dimension metrology, Photoresist processing, Stochastic processes

PROCEEDINGS ARTICLE | March 20, 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Optical lithography, Polymethylmethacrylate, Data modeling, Calibration, 3D modeling, Scanning electron microscopy, Process control, Directed self assembly, Optimization (mathematics), Systems modeling

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Lithography, Metrology, 3D acquisition, Calibration, Scanning electron microscopy, Monte Carlo methods, 3D metrology, Line width roughness, Optical proximity correction, Critical dimension metrology

PROCEEDINGS ARTICLE | September 16, 2014
Proc. SPIE. 9236, Scanning Microscopies 2014
KEYWORDS: Lithography, Metrology, Optical lithography, Calibration, Image processing, Computer simulations, Scanning electron microscopy, Monte Carlo methods, Line width roughness, Critical dimension metrology

Showing 5 of 72 publications
Conference Committee Involvement (2)
Advances in Resist Technology and Processing XXII
28 February 2005 | San Jose, California, United States
Lithography for Semiconductor Manufacturing
19 May 1999 | Edinburgh, United Kingdom
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