Stijn Schoofs
at IMEC
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Lithography, Optical lithography, Silica, Manufacturing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Stochastic processes, System on a chip, Plasma treatment

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Metrology, Etching, Error analysis, Extreme ultraviolet, Optical proximity correction, Critical dimension metrology, Photoresist processing, Stochastic processes, Performance modeling

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top