Stijn Schoofs
at imec
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 13 March 2018 Paper
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Extreme ultraviolet, Optical lithography, Plasma treatment, Stochastic processes, Extreme ultraviolet lithography, Photomasks, System on a chip, Lithography, Silica, Manufacturing

Proceedings Article | 16 October 2017 Presentation + Paper
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Etching, Optical proximity correction, Stochastic processes, Critical dimension metrology, Extreme ultraviolet, Metrology, Photoresist processing, Performance modeling, Error analysis

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