Stijn W. H. K. Steenbrink
at MAPPER Lithography
SPIE Involvement:
Author
Publications (10)

PROCEEDINGS ARTICLE | September 19, 2018
Proc. SPIE. 10775, 34th European Mask and Lithography Conference
KEYWORDS: Lithography, Electron beams, Silicon, Scanning electron microscopy, Optical scanning, Line width roughness, Optical alignment, Semiconducting wafers, Prototyping, Overlay metrology

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Electron beam lithography, Electron beams, Line width roughness, Optical alignment, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | April 27, 2017
Proc. SPIE. 10144, Emerging Patterning Technologies
KEYWORDS: Wafer-level optics, Lithography, Electron beam lithography, Electron beams, Switching, Lithographic illumination, Photomasks, Integrated optics, Optical alignment, Semiconducting wafers

PROCEEDINGS ARTICLE | March 26, 2013
Proc. SPIE. 8680, Alternative Lithographic Technologies V
KEYWORDS: Wafer-level optics, Lithography, Electron beam lithography, Electron beams, Switching, Collimators, Maskless lithography, High volume manufacturing, Semiconducting wafers, Data corrections

PROCEEDINGS ARTICLE | April 1, 2010
Proc. SPIE. 7637, Alternative Lithographic Technologies II
KEYWORDS: Wafer-level optics, Lithography, Electron beam lithography, Electron beams, Switching, Polymethylmethacrylate, Lens design, Collimators, Maskless lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | December 12, 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Electron beam lithography, Electron beams, Manufacturing, Image resolution, Finite element methods, Photomasks, Line width roughness, Maskless lithography, Critical dimension metrology, Semiconducting wafers

Showing 5 of 10 publications
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