Dr. Stuart Sherwin
Research Scientist at EUV Tech
SPIE Involvement:
Author
Publications (25)

Proceedings Article | 13 November 2024 Presentation
Stuart Sherwin, Matt Hettermann, Dave Houser, Luke Long, Patrick Naulleau
Proceedings Volume 13216, 132160V (2024) https://doi.org/10.1117/12.3035715
KEYWORDS: Critical dimension metrology, Extreme ultraviolet, Scatterometry, Photomasks, Scanning electron microscopy, SRAF, Metrology, Simulations, Resolution enhancement technologies, Process control

Proceedings Article | 13 November 2024 Presentation
Seth Cousin, Feng Dong, Stuart Sherwin, Matt Hettermann, Dave Houser, Patrick Naulleau
Proceedings Volume 13216, 132160X (2024) https://doi.org/10.1117/12.3035515
KEYWORDS: Extreme ultraviolet, Plasma, Metrology, Light sources, Copper, Pulsed laser operation, Scatterometry, Reflectometry, Laser systems engineering, Engineering

SPIE Journal Paper | 8 November 2024
JM3, Vol. 23, Issue 04, 041407, (November 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.4.041407

SPIE Journal Paper | 19 September 2024
Luke Long, Stuart Sherwin, Ryan Miyakawa, Tom Pistor, Matt Hettermann, Patrick Naulleau
JM3, Vol. 23, Issue 03, 034401, (September 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.3.034401
KEYWORDS: Optical lithography, Extreme ultraviolet, Ruthenium, Tantalum, Critical dimension metrology, Simulations, Near field, Imaging systems, Data modeling, Semiconducting wafers

Proceedings Article | 10 April 2024 Presentation
Luke Long, Stuart Sherwin, Ryan Miyakawa, Tom Pistor, Matt Hettermann, Patrick Naulleau
Proceedings Volume PC12953, PC129530J (2024) https://doi.org/10.1117/12.3012360
KEYWORDS: Optical lithography, Extreme ultraviolet, Extreme ultraviolet lithography, Phase shifts, Semiconducting wafers, Printing, Panoramic photography, Monte Carlo methods, Lithography, Attenuation

Showing 5 of 25 publications
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