Stuart Sherwin
Graduate Student Researcher at Univ of California Berkeley
SPIE Involvement:
Author
Publications (12)

Proceedings Article | 9 March 2021 Presentation + Paper
Proc. SPIE. 11609, Extreme Ultraviolet (EUV) Lithography XII
KEYWORDS: Multilayers, Optical lithography, Phase contrast, Reflection, Reflectivity, Photomasks, Extreme ultraviolet, Zone plates, 3D image processing, Phase shifts

Proceedings Article | 23 October 2020 Presentation + Paper
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Multilayers, Image processing, Light scattering, Constructive interference, Printing, Reflectometry, Image quality, Extreme ultraviolet, Destructive interference, Phase shifts

Proceedings Article | 20 April 2020 Presentation + Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Microscopes, Phase contrast, Phase imaging, Objectives, Photomasks, Extreme ultraviolet, Phase measurement, Zone plates, Phase shifts, Near field optics

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Diffraction, Multilayers, Scattering, Reflectivity, 3D modeling, Phase retrieval, Scatterometry, Reflectometry, Photomasks, Extreme ultraviolet

Proceedings Article | 11 November 2019 Paper
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Optical design, CMOS sensors, Computational imaging, Phase imaging, Photomasks, Extreme ultraviolet, Charge-coupled devices, Phase measurement, Zone plates, CCD image sensors

Showing 5 of 12 publications
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