Mr. Stuart T. Stanton Profile

Stuart T. Stanton

Senior Project Leader

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 20 August 2001 Paper

CD control analysis of the SCALPEL-HT/alpha optics

Stuart Stanton, Warren Waskiewicz, Eric Munro, John Rouse, Xieqing Zhu

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436643

KEYWORDS: Point spread functions, Charged-particle lithography, Photomasks, Critical dimension metrology, Semiconducting wafers, Data modeling, Scattering, Wafer-level optics, Monte Carlo methods, Calibration

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Proceedings Article | 20 August 2001 Paper

Simulations of a SCALPEL wafer-heating correction using an adaptive Kalman filter

Stuart Stanton

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436644

KEYWORDS: Filtering (signal processing), Charged-particle lithography, Semiconducting wafers, Systems modeling, Mathematical modeling, Distortion, Computer simulations, Resistance, Monte Carlo methods, Optical alignment

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Proceedings Article | 25 June 1999 Paper

Overlay error budgets for a high-throughput SCALPEL system

Stuart Stanton, Reginald Farrow, Gregg Gallatin, James Liddle, Warren Waskiewicz

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351127

KEYWORDS: Optical alignment, Charged-particle lithography, Error analysis, Semiconducting wafers, Distortion, Image segmentation, Photomasks, Signal processing, Sensors, Metrology

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Proceedings Article | 25 June 1999 Paper

Writing strategy for a high-throughput SCALPEL system

Stuart Stanton, James Liddle, Joseph Felker, Warren Waskiewicz, Lloyd Harriott

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351091

KEYWORDS: Photomasks, Image segmentation, Charged-particle lithography, Semiconducting wafers, Optical alignment, Lithography, Wafer-level optics, Error analysis, Imaging systems, Distortion

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Proceedings Article | 5 June 1998 Paper

Critical issues for developing a high-throughput SCALPEL system for sub-0.18-um lithography generations

Stuart Stanton, James Liddle, Warren Waskiewicz, Masis Mkrtchyan, Anthony Novembre, Lloyd Harriott

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309631

KEYWORDS: Charged-particle lithography, Semiconducting wafers, Lithography, Photomasks, Error analysis, Critical dimension metrology, Image segmentation, Diffraction, Ultraviolet radiation, Optical design

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Proceedings Article | 1 October 1990 Paper

Task performance and contrast polarity on hard copy and video displays

James Sheedy, Ian Bailey, Darlene Fong, Mark Ostermeier, Stuart Stanton

Proceedings Volume 1249, (1990) https://doi.org/10.1117/12.19660

KEYWORDS: Visualization, Video, Photography, Lenses, Human vision and color perception, Electronic imaging, Visual process modeling, Spherical lenses, Monochromatic aberrations

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Showing 5 of 6 publications

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