Dr. Suyoung Lee
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | July 28, 2014
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Oxides, Interfaces, Silicon, Oxygen, Finite element methods, Photomasks, Extreme ultraviolet, Neodymium, Ruthenium, Oxidation

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Silica, Ultraviolet radiation, Annealing, Oxygen, Scanning electron microscopy, Transmission electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Wafer-level optics, Cadmium, Ions, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Neodymium, Semiconducting wafers

PROCEEDINGS ARTICLE | October 17, 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Diffractive optical elements, Image processing, Error analysis, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Factor analysis

PROCEEDINGS ARTICLE | May 14, 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Diamond, Quartz, Chromium, Atomic force microscopy, Scanning electron microscopy, Transmittance, Photomasks, Critical dimension metrology, Neodymium, Adhesives

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