Dr. Subhadeep Kal
Senior Process Engineer at TEL Technology Ctr America LLC
SPIE Involvement:
Publications (11)

Proceedings Article | 10 April 2024 Presentation + Paper
Ezra Pasikatan, G. Andrew Antonelli, Nicholas Keller, Subhadeep Kal, Matthew Rednor, Markus Kuhn, Satoshi Murakami, Alain Diebold
Proceedings Volume 12955, 129550K (2024) https://doi.org/10.1117/12.3010523
KEYWORDS: Etching, Silicon, Superlattices, Scatterometry, Film thickness, Germanium, Scanning transmission electron microscopy, Mueller matrices, X-ray diffraction, Metrology

Proceedings Article | 13 June 2022 Presentation
Proceedings Volume PC12056, PC1205604 (2022) https://doi.org/10.1117/12.2613723
KEYWORDS: Field effect transistors, Etching, Dry etching, Very large scale integration, Isotropic etching, Dielectrics, Gallium arsenide, Transistors, Superlattices, Sodium

Proceedings Article | 22 February 2021 Presentation + Paper
Proceedings Volume 11611, 116111S (2021) https://doi.org/10.1117/12.2584751
KEYWORDS: Scatterometry, Field effect transistors, Metrology, Process control, Nanowires, Spectroscopic ellipsometry, Optical lithography, Inspection, Etching, Semiconducting wafers

Proceedings Article | 6 April 2020 Presentation + Paper
Proceedings Volume 11323, 113230V (2020) https://doi.org/10.1117/12.2551727
KEYWORDS: Line edge roughness, Lithography, Etching, Amorphous silicon, Extreme ultraviolet, Oxidation, Extreme ultraviolet lithography, Optical lithography, Scanning electron microscopy, Critical dimension metrology

Proceedings Article | 24 March 2020 Presentation
Proceedings Volume 11329, 113290Q (2020) https://doi.org/10.1117/12.2550539
KEYWORDS: Silicon, Fin field effect transistors, Gallium arsenide, Critical dimension metrology, Plasma, Field effect transistors, Etching, Line edge roughness, Line width roughness, Transistors

Showing 5 of 11 publications
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