Dr. Subhadeep Kal
Senior Process Engineer at TEL Technology Ctr America LLC
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 22 February 2021 Presentation + Paper
Proc. SPIE. 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
KEYWORDS: Metrology, Optical lithography, Etching, Inspection, Scatterometry, Process control, Spectroscopic ellipsometry, Field effect transistors, Semiconducting wafers, Nanowires

Proceedings Article | 6 April 2020 Presentation + Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Amorphous silicon, Lithography, Optical lithography, Etching, Scanning electron microscopy, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Line edge roughness, Oxidation

Proceedings Article | 24 March 2020 Presentation
Proc. SPIE. 11329, Advanced Etch Technology for Nanopatterning IX
KEYWORDS: Fin field effect transistors, Etching, Gallium arsenide, Silicon, Line width roughness, Transistors, Field effect transistors, Critical dimension metrology, Line edge roughness, Plasma

Proceedings Article | 20 March 2020 Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Nanostructures, Diffraction, Metrology, Data modeling, Scattering, Etching, X-rays, Field effect transistors, Critical dimension metrology, X-ray characterization

Proceedings Article | 26 March 2019 Presentation + Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Mueller matrices, Data modeling, Etching, Silicon, Transmission electron microscopy, Scatterometry, Process control, Spectroscopic ellipsometry, Field effect transistors, Critical dimension metrology, Optical materials characterization, Nanowires

Showing 5 of 9 publications
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