Dr. Subhadeep Kal
Senior Process Engineer at TEL Technology Ctr America LLC
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Mueller matrices, Data modeling, Etching, Silicon, Transmission electron microscopy, Scatterometry, Process control, Spectroscopic ellipsometry, Field effect transistors, Critical dimension metrology, Optical materials characterization, Nanowires

Proceedings Article | 18 March 2019
Proc. SPIE. 10963, Advanced Etch Technology for Nanopatterning VIII
KEYWORDS: Semiconductors, Etching, Gallium arsenide, Silicon, Transistors, Field effect transistors, Standards development, Group IV semiconductors, Isotropic etching, Nanowires

Proceedings Article | 27 April 2017
Proc. SPIE. 10149, Advanced Etch Technology for Nanopatterning VI
KEYWORDS: Optical lithography, Etching, Chemistry, Line width roughness, Wet etching, Plasma etching, Line edge roughness, Plasma, Back end of line, Front end of line

Proceedings Article | 26 April 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Lithography, Logic, Optical lithography, Etching, Metals, Control systems, Computer simulations, Photomasks, Extreme ultraviolet, Semiconducting wafers, TCAD, Back end of line, Front end of line

Proceedings Article | 4 April 2017
Proc. SPIE. 10149, Advanced Etch Technology for Nanopatterning VI
KEYWORDS: Semiconductors, Oxides, Optical lithography, Spatial frequencies, Etching, Error analysis, Chemistry, Scanning electron microscopy, Atomic layer deposition, Line width roughness, Double patterning technology, Immersion lithography, Line edge roughness, Error control coding, Semiconducting wafers, Plasma

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